Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure
International Journal of Science and Research (IJSR)

International Journal of Science and Research (IJSR)
Call for Papers | Fully Refereed | Open Access | Double Blind Peer Reviewed

ISSN: 2319-7064


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Research Paper | Mechanical Engineering | Morocco | Volume 9 Issue 12, December 2020 | Popularity: 6.7 / 10


     

Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure

Mohamed El Haim, Mohamed Atounti


Abstract: Discharge characteristics of argon microwave plasma were investigated by using fluid simulation of a MPACVD (Microwave Plasma Assisted Chemical Vapor Deposition) reactor based on finite elements method at low pressure (25-250) Pa. The microwave power was 2.45 GHz TM mode transmitted through the resonant cavity. Microwave power and pressure were considered simulation parameters and argon was used for working gas. A self-consistent fluid model was developed in Comsol Multiphysics Plasma Module for studying the discharge phenomena. The 2D plasma fluid model gives a complete description of spatial-and time evolution of the discharge characteristics such us: electron density and electron temperature. Simulation results show a strong effect of input parameters on the species densities distribution in the plasma.


Keywords: Finite element method, COMSOL MWP module, microwave plasma, plasma fluid model


Edition: Volume 9 Issue 12, December 2020


Pages: 16 - 19



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Mohamed El Haim, Mohamed Atounti, "Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure", International Journal of Science and Research (IJSR), Volume 9 Issue 12, December 2020, pp. 16-19, https://www.ijsr.net/getabstract.php?paperid=ART20202595, DOI: https://www.doi.org/10.21275/ART20202595

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