Effect of Insulator Thickness on the Barrier Height of Thin Film MIS Structure
Abstract: Metal-semiconductor and metal-insulator-semiconductor thin films have been prepared using thermal evaporation technique. The value of the barrier height (bn) which was calculated using, experimental (I-V) measurements and activation energy method showed that (bn) increases with increasing insulator thickness.
Keywords: effect of insulator thickness on the barrier
How to Cite?: Dr. Jassim Mohammed Salih Al-fahdawi, "Effect of Insulator Thickness on the Barrier Height of Thin Film MIS Structure", Volume 4 Issue 9, September 2015, International Journal of Science and Research (IJSR), Pages: 1295-1297, https://www.ijsr.net/getabstract.php?paperid=SUB158265, DOI: https://dx.doi.org/10.21275/SUB158265