Synthesis and Characterization of Boron-Doped ZnO Thin Films Using a Novel Spray CVD Technique

S. C. Yadav, M. D. Uplane

Abstract: This study presents the successful synthesis of Boron-doped Zinc Oxide (ZnO:B) thin films using a newly developed spray Chemical Vapor Deposition (CVD) technique at low substrate temperatures. The objective is to explore the effects of boron doping concentration and film thickness on the structural, morphological, optical, and electrical properties of ZnO thin films. Characterization was conducted using XRD, FESEM, AFM, UV-Vis spectroscopy, Hall Effect measurements, and photoluminescence spectroscopy. The optimized doping concentration (0.8 at%) demonstrated enhanced crystallinity, improved optical transmittance (~90%), and reduced resistivity (~7.7?10?? ??cm), making the films suitable for applications in optoelectronics and transparent conductive devices.

Keywords: ZnO, Boron doping, Spray CVD, Thin films, Optical properties

How to Cite?: S. C. Yadav, M. D. Uplane, "Synthesis and Characterization of Boron-Doped ZnO Thin Films Using a Novel Spray CVD Technique", Volume 14 Issue 8, August 2025, International Journal of Science and Research (IJSR), Pages: 286-292, https://www.ijsr.net/getabstract.php?paperid=SR25803180257, DOI: https://dx.doi.org/10.21275/SR25803180257