Advancing Semiconductor Manufacturing with Supercritical Fluid Extrusion: A Sustainable and Efficient Approach
International Journal of Science and Research (IJSR)

International Journal of Science and Research (IJSR)
Call for Papers | Fully Refereed | Open Access | Double Blind Peer Reviewed

ISSN: 2319-7064


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Technical Report | Manufacturing Technology | United States of America | Volume 14 Issue 2, February 2025 | Popularity: 5.1 / 10


     

Advancing Semiconductor Manufacturing with Supercritical Fluid Extrusion: A Sustainable and Efficient Approach

Sugirtha Krishnamurthy


Abstract: Supercritical fluid extrusion (SCFE) is an emerging technology with significant potential to revolutionize semiconductor processing. Traditional methods often rely on harsh chemicals, high temperatures, and vacuum environments, posing challenges in terms of environmental impact, material compatibility, and processing limitations. SCFE, utilizing supercritical fluids (most commonly carbon dioxide) as tunable solvents and transport media, offers a compelling alternative. This abstract examines the application of SCFE in diverse aspects of semiconductor manufacturing, including the deposition of thin films and nanomaterials, the removal of contaminants and residues, and the creation of advanced packaging structures. The unique properties of supercritical fluids?such as their high diffusivity, low viscosity, and tunable solvent power?enable precise control over processing conditions, improved material purity, and enhanced device performance. Moreover, SCFE's inherent sustainability offers reduced waste generation and lower energy consumption, aligning with the increasing demand for eco - friendly semiconductor manufacturing. This technology holds promise for enabling the development of smaller, faster, and more efficient semiconductor devices while simultaneously addressing the industry's growing environmental concerns.


Keywords: Supercritical Fluid Extrusion, Semiconductor Processing, Sustainable Manufacturing, Thin Film Deposition, Contaminant Removal


Edition: Volume 14 Issue 2, February 2025


Pages: 1453 - 1454


DOI: https://www.doi.org/10.21275/SR25223051454


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Sugirtha Krishnamurthy, "Advancing Semiconductor Manufacturing with Supercritical Fluid Extrusion: A Sustainable and Efficient Approach", International Journal of Science and Research (IJSR), Volume 14 Issue 2, February 2025, pp. 1453-1454, https://www.ijsr.net/getabstract.php?paperid=SR25223051454, DOI: https://www.doi.org/10.21275/SR25223051454

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