International Journal of Science and Research (IJSR)

International Journal of Science and Research (IJSR)
Call for Papers | Fully Refereed | Open Access | Double Blind Peer Reviewed

ISSN: 2319-7064


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Research Paper | Biology | India | Volume 5 Issue 3, March 2016


Optimization of Physiochemical Conditions for the Production of Catechol-2, 3-dioxygenase from Phenol Degrading Bacteria under Submerged Fermentation

Mukesh Kumar Singh | Bhawana [10] | Ajay Kumar [47]


Abstract: Phenol and its components are extremely toxic and can easily be found in different industrial sewage such as oil refinery, petrochemical industry and mines, especially collier and chemical factories and one of most important pollutant of the environment (especially, water). Many bacteria are capable of utilising phenol via Catechol pathway to yield energy therefore our, efforts have been done to find the most efficient microbe which can be used for the bioremediation of phenol. In this study Phenol degrading bacteria were isolated by using Bushnell Haas Agar. Among the isolated bacteria, the efficient organism is identified by using phenol degradation assay. Strain BP1 was found to be most efficient in phenol degradation. ) was the most potent phenol degrading bacteria showing complete degradation of 600mg/liter of phenol within 24hours. The isolate showed maximum growth in 600mg/liter of phenol and was found to tolerate and degrade even as high as 1000mg/liter of phenol. Thereafter strain BP1 is biochemically characterized and optimized the physiochemical conditions for the production of catechol-2, 3-dioxygenase of Strain BP1 under submerged fermentation. We use the Response Surface Methodology (RSM) to optimize the culture condition for the production of phenol degrading enzyme catechol-2, 3-dioxygenase to elucidate the optimum level of the most significant parameters for catechol-2, 3-dioxygenase production, with minimum effort and time.


Keywords: Phenol, catechol-2, 3-dioxygenase, Bacteria, Response Surface Methodology


Edition: Volume 5 Issue 3, March 2016,


Pages: 323 - 328


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