Preparation Antireflection Coating Using Plasma Technique

Alaa Nazar Abdalgaffar, Kadhim A. Aadim, Sanar Najim Abdullah

Abstract: In this research, MgO thin films deposited on glass substrate with different thicknesses (68, 88, 100 and120)nm at room temperature by DC plasma technique. Process using magnesium oxide target under Ar gas pressure to prepare single layer antireflection coating. The optical properties and structural have been determined. The optical performance was computed with the aid of MATLAB over the visible and near infrared region with optical thickness in 1.25L. . Results shows that can be obtained the best wide band optical performance for AR'Cs at 100 nm thickness nanostructure single layer.

Keywords: Antireflection coating, DC plasma technique, MgO, sputtering

How to Cite?: Alaa Nazar Abdalgaffar, Kadhim A. Aadim, Sanar Najim Abdullah, "Preparation Antireflection Coating Using Plasma Technique", Volume 6 Issue 6, June 2017, International Journal of Science and Research (IJSR), Pages: 1341-1345, https://www.ijsr.net/getabstract.php?paperid=ART20174458, DOI: https://dx.doi.org/10.21275/ART20174458