Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure
International Journal of Science and Research (IJSR)

International Journal of Science and Research (IJSR)
www.ijsr.net | Open Access | Fully Refereed | Peer Reviewed International Journal

ISSN: 2319-7064

Document de recherche | Mechanical Engineering | Maroc | Volume 9 Issue 12, December 2020

Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure

Mohamed El Haim, Mohamed Atounti

Discharge characteristics of argon microwave plasma were investigated by using fluid simulation of a MPACVD (Microwave Plasma Assisted Chemical Vapor Deposition) reactor based on finite elements method at low pressure (25-250) Pa. The microwave power was 2.45 GHz TM mode transmitted through the resonant cavity. Microwave power and pressure were considered simulation parameters and argon was used for working gas. A self-consistent fluid model was developed in Comsol Multiphysics Plasma Module for studying the discharge phenomena. The 2D plasma fluid model gives a complete description of spatial-and time evolution of the discharge characteristics such us: electron density and electron temperature. Simulation results show a strong effect of input parameters on the species densities distribution in the plasma.

Keywords: Finite element method, COMSOL MWP module, microwave plasma, plasma fluid model

Edition: Volume 9 Issue 12, December 2020

Pages: 16 - 19

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How to Cite this Article?

Mohamed El Haim, Mohamed Atounti, "Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure", International Journal of Science and Research (IJSR), https://www.ijsr.net/search_index_results_paperid.php?id=ART20202595, Volume 9 Issue 12, December 2020, 16 - 19

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