Effects of Annealing Temperature on CdO Thin Films Produced by Using Electro Deposition Method under Magnetic Field
International Journal of Science and Research (IJSR)

International Journal of Science and Research (IJSR)
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ISSN: 2319-7064



Research Paper | Materials Engineering | Turkey | Volume 7 Issue 10, October 2018

Effects of Annealing Temperature on CdO Thin Films Produced by Using Electro Deposition Method under Magnetic Field

Ayca Kiyak Yildirim

For obtaining to CdO thin film, electrochemical deposition method was used under magnetic field at different annealing temperature and the results was reported in this paper. It was understood that there are effects of annealing temperature on the CdO structural and physical properties of the samples. The structure of CdO samples was analyzed by X-ray diffraction. It is realized that crystal structures of the samples was polycrystalline and they have several peaks of cubic face structure. The, microstrain, dislocation density, crystallite size and number of dislocations of the CdO thin film were calculated and listed. Optical band gap decreases from 2.31 eV to 1.95 eV with increase in annealing temperature. it is evident that the SEM images are consisted of the CdO nanocrystalline grains along with some spongy clusters. The spongy cluster increases as annealing temperature increases.

Keywords: CdO, magnetic field, spongy cluster, annealing temperature

Edition: Volume 7 Issue 10, October 2018

Pages: 1331 - 1336

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Ayca Kiyak Yildirim, "Effects of Annealing Temperature on CdO Thin Films Produced by Using Electro Deposition Method under Magnetic Field", International Journal of Science and Research (IJSR), https://www.ijsr.net/search_index_results_paperid.php?id=ART20192176, Volume 7 Issue 10, October 2018, 1331 - 1336

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