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Research Paper | Physics Science | Iraq | Volume 6 Issue 6, June 2017
Preparation Antireflection Coating Using Plasma Technique
Alaa Nazar Abdalgaffar | Kadhim A. Aadim [2] | Sanar Najim Abdullah
Abstract: In this research, MgO thin films deposited on glass substrate with different thicknesses (68, 88, 100 and120)nm at room temperature by DC plasma technique. Process using magnesium oxide target under Ar gas pressure to prepare single layer antireflection coating. The optical properties and structural have been determined. The optical performance was computed with the aid of MATLAB over the visible and near infrared region with optical thickness in 1.25L. . Results shows that can be obtained the best wide band optical performance for AR'Cs at 100 nm thickness nanostructure single layer.
Keywords: Antireflection coating, DC plasma technique, MgO, sputtering
Edition: Volume 6 Issue 6, June 2017,
Pages: 1341 - 1345
Preparation Antireflection Coating Using Plasma Technique
How to Cite this Article?
Alaa Nazar Abdalgaffar, Kadhim A. Aadim, Sanar Najim Abdullah, "Preparation Antireflection Coating Using Plasma Technique", International Journal of Science and Research (IJSR), https://www.ijsr.net/get_abstract.php?paper_id=ART20174458, Volume 6 Issue 6, June 2017, 1341 - 1345, #ijsrnet
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